Nikon TU Plan ELWD 50x Brightfield Darkfield Objective UMPLFLN20XW manufactured in Japan

manufactured in Japan

and detection of subsurface defects that are invisible in visible light

2 rotatable Filter Size 32mm Rotatable Positions 2 (allow in-path angular adjustment of installed element) Country of Origin Japan HS Code 901190 Condition New / OEM Universities and research institutions are welcome to purchase using an official purchase order

Macro Calibration card INTERFACE & BUTTON FUNCTIONS USB MultiPort USB WiFi Dongle or USB Mouse HDMI HDMI Output DC12V DC12V Power in SD SD Card Slot ON/OFF Power On/Off Switch LED Power Off Red

Once positioned

Nikon TU Plan ELWD 50x Brightfield Darkfield Objective UMPLFLN20XW manufactured in JapanNikon TU Plan ELWD 50x 0. 60 EPI D Objective Extra Long Working Distance Exceptional 11mm working distance ideal for thick specimens and inspection tasks Dual mode capability: brightfield and darkfield (EPI D) illumination Infinity corrected optics for modern Nikon industrial microscope systems Optics are flawless. Light signs of use on outer metal barrel save 52% vs. new list price of $4,995 Product Description The Nikon TU Plan ELWD 50x 0. 60 EPI D