Nikon CFI Plan Fluor ELWD 60X Phase Contrast Objective 11501502 Standard 50× objectives typically offer
Description
Standard 50× objectives typically offer working distances of 2–3mm
and infrared imaging
Semiconductor IC defect evaluation and inspection at 100×
providing clearance for the full range of semiconductor inspection fixtures
365nm) Single LED-DAPI-B 49000 DAPI (with XTML
Nikon CFI Plan Fluor ELWD 60X Phase Contrast Objective 11501502 Standard 50× objectives typically offerNikon CFI Plan Fluor ELWD 60X Phase Contrast Objective a high performance, extra long working distance objective engineered for advanced live cell and biological imaging at 60X on Nikon CFI series platforms. 60X magnification with Plan Fluor optical correction Extra Long Working Distance (ELWD) for imaging through thick culture vessels Phase contrast for label free live cell imaging Multi purpose: brightfield, fluorescence, and phase contrast Infinity
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